Material: Titanium


    Purity: 99.9% - 99.99%


    Grain Size: 100um

Product Detail

Shanghai Metal Corporation is a Titanium sputtering target supplier and manufacturer.

Sputtering is the manufacturing process of thin film deposition and the core of semiconductor, disk drive, optical disc and optical device industry. The sputtering rate varies with the energy of the impact particle, the incident angle, the relative mass of the particle and the target atom, and the surface binding energy of the target atom. Several different methods of physical gas deposition are widely used in sputtering coaters, including ion beam, ion assisted sputtering, reactive sputtering in oxygen environment, gas flow and magnetron sputtering. High purity titanium has gettering properties, especially hydrogen, CH4 and CO2 gases, so it can be widely used in high vacuum and ultra-high vacuum systems. When the line networks of LSI, VLSI and ULSI are fabricated by high-purity titanium sputtering, these integrated components can become particularly light, thin, small and dense. High purity titanium target can also be used as barrier metal material.

If you want to know more about Titanium sputtering target, please feel free to contact us, we will reply you within 24 hours.

Packaging of Titanium Sputtering Target

Shanghai Metal Products are packed and labeled according to the regulations and customer's requests. Great care is taken to avoid any damage which might be caused during storage or transportation. In addition, clear labels are tagged on the outside of the packages for easy identification of the product I. D. and quality information.

1) Shanghai Metal Standard

2) Customization

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